Synthesis of Nanomaterials-II (2143904)  

Syllabus

Sr. Topics Teaching Hours Module Weightage
1
PRINCIPLES OF ELECTRON BEAM LITHOGRAPHY:

Physics and chemistry of resists. Processes of interaction electrons with solids, diffusion, secondary electrons, proximity effect and principles of its correction. Alignment of Nano-elements in hybrid nanostructures.

6
20 %
2
SELF-ALIGNMENT TECHNIQUES:

Self Narrowing Atomic-beam Pantography. Physical Vapour and Chemical Vapour thin layer Deposition techniques (CVD and PVD).Thickness and deposition rate monitoring. Medium, high, and ultra-high vacuum systems. Ion beam and plasma sources and principles of their operation.

6
20 %
3
PHYSICAL VAPOUR AND CHEMICAL VAPOUR THIN LAYER DEPOSITION TECHNIQUES (CVD AND PVD)
PHYSICAL VAPOUR AND CHEMICAL VAPOUR THIN LAYER DEPOSITION TECHNIQUES (CVD AND PVD)
5
15 %
4
NANOFABRICATION METHODS COMBINING SPM AND E-BEAM LITHOGRAPHY
NANOFABRICATION METHODS COMBINING SPM AND E-BEAM LITHOGRAPHY
5
15 %
5
VERSATILE SYNTHESIS METHOD RF PLASMA CHEMICAL METHOD:

Introduction of RF Plasma Chemical Method, Working Principle, and Applications

5
15 %
6
PULSED LASER DEPOSITION:

Introduction, Working Principle Of PLD, Applications Of PLD

5
15 %
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